A stereolithographic writing apparatus (1) for carrying out two-photon polymerization within a photopolymerizable substrate medium (100), the apparatus (1) comprising: a source of electromagnetic radiation (10) for emitting a beam of photons (B) suitable for effecting two-photon polymerization in the substrate medium (100); means (M1, M2, M3, WP1, AOM1, WP2, AOM2, M4, M5, WP3, AOD1, AOD2, M6, AL1, S, M7, AL2, M8, M9, OBJ1) for defining an optical propagation path of the photon beam (B) as it passes from the electromagnetic radiation source (10) towards the substrate medium (100); beam control means (AOM1, AOM2, AOD1, AOD2) within the optical propagation path for steering and focusing the photon beam (B) into a selected target region of the substrate medium (100) in which the two-photon polymerization can occur; and means (30) for moving the substrate medium (100) relative to the photon beam so as to sequentially expose different target regions of the substrate medium (100) to the photon beam (B) to effect two-photon polymerization sequentially at those different target regions of the substrate medium (100); wherein the beam control means comprises: at least one acousto-optic deflector (AOD1, AOD2) for spatially controlling the direction of the photon beam (B) as it passes along the optical propagation path, and at least one acousto-optic modulator (AOM1, AOM2) for modulating the intensity and/or frequency and/or a cross-sectional parameter of the photon beam (B) as it passes along the optical propagation path.
- 출원번호 : EP2024/077333
- 출원인 : IQS NANO S.R.O.;INSTITUTE OF SCIENTIFIC INSTRUMENTS OF THE CZECH ACADEMY OF SCIENCES;
- 특허번호 :
- IPC : B29C-064/135(2017.01);B29C-064/268(2017.01);B29C-064/282(2017.01);B33Y-030/00(2015.01);G03F-007/00(2006.01);