According to an embodiment of the present disclosure, provided is a radiation element structure arranged on a reflective plate, comprising: a radiation unit including a dielectric portion made from plastic material and first to fourth radiation arms arranged in a four-sided symmetrical structure on one surface of the dielectric portion; and a plurality of balun units, including a balun body connecting the reflective plate and the radiation unit, a feed line disposed on the upper surface of the balun body to feed the radiation unit, and a ground disposed on the lower surface of the balun body.

• 출원번호 : 18900594
• 출원인 : KMW INC.
• 특허번호 :
• IPC : H01Q-005/10(2006.01);H01Q-001/48(2006.01);H01Q-001/50(2006.01);H01Q-019/10(2006.01);

A method for forming a pattern on a substrate disclosed. The method comprising, providing an Extreme Ultraviolet (EUV) lithography system having an exposure chamber, providing a substrate to the exposure chamber, the substrate comprising a patternable layer, the patternable layer comprising a photosensitive surface termination; and exposing the substrate to EUV radiation while exposing the patternable layer to a reactive gas, thereby forming a pattern on the patternable layer, comprising exposed areas and unexposed areas, the unexposed areas comprising the photosensitive surface termination and the exposed areas comprising an altered surface termination.

• 출원번호 : 18900231
• 출원인 : Patel, Kishan Ashokbhai
• 특허번호 :
• IPC : G03F-007/00(2006.01);C23C-016/24(2006.01);C23C-016/455(2006.01);G03F-007/16(2006.01);H01L-021/033(2006.01);

A short-wave infra-red, SWIR, radiation detection device comprises: a first metallic layer providing a first set of connections from a readout circuit to respective cells of a matrix, the metallic layer reflecting SWIR wavelength radiation. Each matrix cell comprises at least one stack of layers including: a first layer of doped semiconductor material formed on the first metallic layer; an at least partially microcrystalline semiconductor layer formed over the first doped layer; a second layer of semiconductor material formed on the microcrystalline semiconductor layer; at least one microcrystalline semiconductor layer; and in some embodiments a second metallic layer interfacing the microcrystalline semiconductor layer(s), the interface being responsive to incident SWIR radiation to generate carriers within the stack. The stack has a thickness T=λ2⁢N between reflective surfaces of the first and second metallic layers.

• 출원번호 : 18899447
• 출원인 : O'Neill, Kevin
• 특허번호 :
• IPC : H01L-031/109(2006.01);H01L-027/146(2006.01);H01L-031/0232(2006.01);

A method for regenerating a carbon dioxide (CO2) sorbent material, the method comprising: (i) contacting a sorbent-CO2 complex in an aqueous solution containing a reversible photoacid, wherein the CO2 in the sorbent-CO2 complex is in the form of bicarbonate, carbonate, or carbamate; and (ii) exposing the aqueous solution to electromagnetic radiation having a wavelength that induces proton release from the photoacid and subsequent protonation of the bicarbonate, carbonate, or carbamate in the sorbent-CO2 complex to result in release of CO2 and water and regeneration of the sorbent material. The method may also include re-using the regenerated sorbent to capture carbon dioxide. The sorbent may be, for example, an amino acid (e.g., glycine), alkylamine, alkanolamine, or alkali hydroxide. The reversible photoacid may more particularly be a metastable-state photoacid.

• 출원번호 : 18899069
• 출원인 : Ma, Yingzhong
• 특허번호 :
• IPC : B01J-020/34(2006.01);B01J-020/22(2006.01);

An X-ray inspection apparatus includes an X-ray radiator configured to generate X-rays by applying a first voltage between a negative pole and a positive pole in an X-ray bulb and radiate X-rays to a transported article, an X-ray detector configured to detect the X-rays radiated from the X-ray radiator, an inspection unit configured to generate an X-ray transmission image based on a detection result of the X-ray detector and inspect the article, and a control unit configured to change a voltage applied between the negative pole and the positive pole. The control unit applies a second voltage higher than the first voltage between the negative pole and the positive pole before starting radiation of X-rays generated by applying the first voltage or after completing radiation of X-rays generated by applying the first voltage.

• 출원번호 : 18898702
• 출원인 : YURUGI, Futoshi
• 특허번호 :
• IPC : G01N-023/04(2018.01);G01N-023/083(2018.01);

Described herein are systems and methods for positioning a radiation source with respect to one or more regions of interest in a coordinate system. Such systems and methods may be used in emission guided radiation therapy (EGRT) for the localized delivery of radiation to one or more patient tumor regions. These systems comprise a gantry movable about a patient area, where a plurality of positron emission detectors, a radiation source are arranged movably on the gantry, and a controller. The controller is configured to identify a coincident positron annihilation emission path and to position the radiation source to apply a radiation beam along the identified emission path. The systems and methods described herein can be used alone or in conjunction with surgery, chemotherapy, and/or brachytherapy for the treatment of tumors.

• 출원번호 : 18899549
• 출원인 : MAZIN, Samuel
• 특허번호 :
• IPC : A61N-005/10(2006.01);A61B-005/055(2006.01);A61B-006/00(2024.01);A61B-006/03(2006.01);A61B-006/12(2006.01);A61B-006/46(2024.01);A61B-090/00(2016.01);G01T-001/29(2006.01);

The invention relates to a method for the replication of a polychromatic hologram. The method involves providing a master assembly, comprising a first master hologram and a second master hologram which are arranged in a layer structure. The method also involves providing a replication assembly and aligning the first master hologram in relation to the replication assembly by translation and/or by rotation of the master assembly. The first master hologram is exposed by means of electromagnetic radiation of a first wavelength range in order to obtain a first replicated hologram in the replication assembly. In addition, the method involves aligning the second master hologram in relation to the replication assembly by translation and/or by rotation of the master assembly. The second master hologram is exposed by means of electromagnetic radiation of a second wavelength range in order to obtain a second replicated hologram in the replication assembly. The invention also relates to a replication assembly that can be produced by means of the method according to the invention. In addition, the invention relates to a master element and a device for carrying out the method according to the invention.

• 출원번호 : EP2024/077268
• 출원인 : CARL ZEISS JENA GMBH
• 특허번호 :
• IPC : G03H-001/20(2006.01);G03H-001/18(2006.01);G03H-001/22(2006.01);G03H-001/26(2006.01);

Methods, systems, and computer readable media are provided for reduced-dose angiography using machine learning (e.g., deep learning) with a concordance metric indicating a degree of similarity between an estimated segmentation of angiographic images generated by a machine learning model and segmented benchmark angiographic images provided as inputs to the machine learning model. Briefly, techniques described herein may use a neural network trained to conserve/preserve angiographic image quality while reducing the angiographic dose of potentially harmful chemical contrast and/or x-ray radiation by employing a concordance metric.

• 출원번호 : US2024/048938
• 출원인 : ANGIOWAVE IMAGING, INC.;BUTLER, William E.;
• 특허번호 :
• IPC : A61B-006/50(2024.01);G06T-007/10(2017.01);

Systems and methods are disclosed to provide and substantially align emitted light and electromagnetic radiation using a therapy device comprising at least one antenna in or on a housing configured to emit electromagnetic radiation according to an antenna field of view and one or more light sources in or on the housing configured to emit a visible light according to a light field of view.

• 출원번호 : IL2024/050963
• 출원인 : ESSENCE SECURITY INTERNATIONAL (E.S.I.) LTD.
• 특허번호 :
• IPC : A61B-018/18(2006.01);A61N-005/06(2006.01);G16H-020/40(2018.01);B01J-019/12(2006.01);

The invention relates to an optical device for machining a sample by means of laser radiation in at least two machining steps. The device comprises at least one beam splitter, a first optical machining device, and a second optical machining device. The beam splitter is arranged such that a laser beam can be split into at least two partial beams. The partial beams can be oriented towards the sample such that the sample is machined in two machining steps. The optical device comprises a means for changing the power density, so that the power density of the first partial beam is greater than the power density of the second partial beam. The invention also relates to an optical system comprising the optical device, to a method for machining the sample, and to a sample machined by means of the optical device.

• 출원번호 : EP2024/077263
• 출원인 : SURFUNCTION GMBH;TECHNISCHE UNIVERSITÄT DRESDEN;
• 특허번호 :
• IPC : B23K-026/06(2014.01);B23K-026/067(2006.01);B23K-026/352(2014.01);