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  • 506017

    wo

    A monitoring system (100). The monitoring system (100) comprises an emission system (106) comprising: one or more environment mapping emitters (108); and one or more targeting optical systems (110). Each environment mapping emitter (108) is configured to emit electromagnetic radiation at a respective targeting optical system (110) of the one or more targeting optical systems (110). Each targeting optical system (110) is configured to direct the electromagnetic radiation towards a respective target region of an environment of the monitoring system. The monitoring system (100) comprises a sensing system (120) that is configured to generate sensing system data based at least in part on the electromagnetic radiation emitted by the environment mapping emitters (108) that is reflected by the target regions of the environment.
    • 출원번호 : AU2024/050642
    • 출원인 : LAZER SAFE PTY LTD
    • 특허번호 :
    • IPC : G01S-017/02(2020.01);G01C-003/02(2006.01);G01S-007/48(2006.01);G01S-007/481(2006.01);G01S-007/88(2006.01);G01S-007/89(2006.01);
  • 506016

    wo

    A polymer composition including an acrylate monomer backbone, and at least one functional group comprising silicon to oxygen bonding and carbon to halogen bonding, wherein a range of elemental content of silicon, and at least one of fluorine and chloride provides for emissivity higher than 90% of radiation having wavelengths in an atmospheric transparent window; and absorption lower than 5% at visible light wavelength regions.
    • 출원번호 : US2024/034512
    • 출원인 : FUTUREWEI TECHNOLOGIES, INC.
    • 특허번호 :
    • IPC : C08F-230/08(2006.01);C08F-020/02(2006.01);C08F-220/00(2006.01);
  • 506015

    wo

    The invention relates to a method (S100, S200, S300, S400, S500) for determining at least one component of a hemispherical irradiance (120) of solar radiation in an arbitrary plane, wherein the at least one component has a diffuse irradiance (122) and/or a direct irradiance (124), comprising the following steps: (i) collecting measurement data relating to the hemispherical irradiance (120) using a radiation sensor unit (12) in a field of view (26) over a plane (46) of the radiation sensor unit (12); (ii) capturing an image (110) of the sky (50) using a camera (14) in a field of vision (32) over a plane (48) of the camera (14); (iii) extracting (S130, S230, S330, S430, S530) features from the image (110) of the sky (50) by means of a first machine learning model and producing a result data set; (iv) merging (S140, S240, S340, S440, S540) the measurement data to form a common data set; (v) determining (S150, S250, S350, S450, S550) the at least one component of the hemispherical irradiance (120) in the arbitrary plane from the data set by means of a second machine learning model.
    • 출원번호 : EP2024/066985
    • 출원인 : DEUTSCHES ZENTRUM FÜR LUFT- UND RAUMFAHRT E.V.;
    • 특허번호 :
    • IPC : H02S-050/15(2014.01)
  • 506014

    wo

    A polymer composition including an acrylate monomer backbone, and at least one functional group comprising silicon to oxygen bonding and carbon to halogen bonding, wherein a range of elemental content of silicon, and at least one of fluorine and chloride provides for emissivity higher than 90% of radiation having wavelengths in an atmospheric transparent window; and absorption lower than 5% at visible light wavelength regions.
    • 출원번호 : US2024/034512
    • 출원인 : FUTUREWEI TECHNOLOGIES, INC.
    • 특허번호 :
    • IPC :
  • 506013

    us

    An organic optoelectronic component includes an organic functional layer stack between a first electrode and a second electrode including a light-emitting layer formed to emit radiation during operation of the component; a coupling-out layer arranged above the first electrode and/or the second electrode which is in a beam path of the radiation of the light-emitting layer; and a protective layer above the coupling-out layer, wherein the coupling-out layer includes a structured layer and a planarization layer arranged thereabove and the structured layer has a structured surface structured at least in places, the planarization layer planarizes the structured surface of the structured layer, the protective layer cannot be removed without at least partially destroying the coupling-out layer, and adhesion of the structured layer to the planarization layer is smaller than adhesion of the protective layer to the planarization layer.
    • 출원번호 : 18747012
    • 출원인 : Pictiva Displays International Limited
    • 특허번호 :
    • IPC : H10K-050/854(2006.01);H10K-050/844(2006.01);
  • 506012

    us

    The disclosure is directed to devices for use in radiation therapy. Various configurations of shielding materials within shielding layers, such as for use in shielding radiation from radioactive sources within implanted radioactive carriers, are discussed herein.
    • 출원번호 : 18747335
    • 출원인 : Brachman, David
    • 특허번호 :
    • IPC : A61N-005/10(2006.01);G21F-003/00(2006.01);
  • 506011

    us

    A fabric (30) includes a first flexible fabric layer (32), having fabric emissivity properties in a visible radiation range that are selected so as to mimic ambient emissivity properties of a deployment environment of the fabric, and at least one second flexible fabric layer (34), which is joined to the first flexible fabric layer, and which is configured to scatter long-wave radiation that is incident on the fabric. The first and second flexible fabric layers are perforated by a non-uniform pattern of perforations (44) extending over at least a part of the fabric.
    • 출원번호 : 18746170
    • 출원인 : Morag, Elad
    • 특허번호 :
    • IPC : B32B-038/00(2006.01);B32B-003/26(2006.01);B32B-005/26(2006.01);F41H-003/00(2006.01);
  • 506010

    us

    The actinic ray-sensitive or radiation-sensitive resin composition includes a resin, and an ionic compound having, in at least one of a cationic moiety or an anionic moiety, a group represented by —SF4R provides a very good pattern profile in the formation of an ultrafine pattern such as a line-and-space pattern of 25 nm or less, and a hole pattern having a hole diameter of 25 nm or less.
    • 출원번호 : 18746861
    • 출원인 : FUJIFILM Corporation
    • 특허번호 :
    • IPC : G03F-007/004(2006.01);C07C-043/29(2006.01);C07C-062/24(2006.01);C07C-063/70(2006.01);C07C-065/10(2006.01);C07C-233/91(2006.01);C07C-309/12(2006.01);C07C-309/19(2006.01);C07C-311/09(2006.01);C07C-311/48(2006.01);C07C-311/51(2006.01);C07C-323/09(2006.01);C07C-381/12(2006.01);C07D-327/06(2006.01);C07D-333/54(2006.01);C07D-333/76(2006.01);
  • 506009

    us

    An image processing apparatus includes at least one processor, in which the at least one processor is configured to: detect calcification from a radiation image obtained by imaging a breast by irradiating the breast with radiation; generate a low resolution image from a calcification distribution image representing a detection result of the calcification by reducing a resolution to be lower than a resolution of the radiation image; and determine a type of a distribution state of the calcification based on the low resolution image.
    • 출원번호 : 18747369
    • 출원인 : MACHII, Yusuke
    • 특허번호 :
    • IPC : G06T-007/00(2006.01);G06T-003/40(2006.01);
  • 506008

    us

    A system identifying a source of radiation is provided. The system includes a radiation source detector and a radiation source identifier. The radiation source detector receives measurements of radiation; for one or more sources, generates a detection metric indicating whether that source is present in the measurements; and evaluates the detection metrics to detect whether a source is present in the measurements. When the presence of a source in the measurements is detected, the radiation source identifier for one or more sources, generates an identification metric indicating whether that source is present in the measurements; generates a null-hypothesis metric indicating whether no source is present in the measurements; evaluates the one or more identification metrics and the null-hypothesis metric to identify the source, if any, that is present in the measurements.
    • 출원번호 : 18747014
    • 출원인 : Labov, Simon E.
    • 특허번호 :
    • IPC : G01V-005/26(2006.01);G01T-001/167(2006.01);G01T-001/36(2006.01);G01V-005/20(2006.01);