• 출원번호 : 18669238
• 출원인 : LANTERN PHARMA INC.
• 특허번호 :
• IPC : A61K-031/122(2006.01);A61K-031/282(2006.01);A61K-031/337(2006.01);A61K-031/513(2006.01);A61K-031/704(2006.01);A61K-031/7068(2006.01);A61N-005/10(2006.01);A61P-035/00(2006.01);

• 출원번호 : 18668531
• 출원인 : GE-Hitachi Nuclear Energy Americas LLC
• 특허번호 :
• IPC : G21C-017/022(2006.01);G01F-001/68(2006.01);G21C-017/032(2006.01);G21C-017/10(2006.01);G21C-017/112(2006.01);

A method of foreign object debris discrimination includes illuminating a particle located within a sensing volume with a modulated electromagnetic radiation pulse emitted from a source; receiving one or more electromagnetic radiation return signals that have been scattered by the particle illuminated by the modulated electromagnetic radiation pulse at a detector; mixing, using a controller, the electromagnetic radiation return signal of amplitude IRS and frequency fRS with a reference signal of amplitude ILS and frequency fRS; analyzing, using the controller, an amplitude of the mixed signal √{square root over (ILSIRS)}, and frequency of the mixed signal, fRS−fLS; and classifying, using the controller, a particle position, a velocity, and electromagnetic characteristic of the particle based on the amplitude, √{square root over (ILSIRS)}, and frequency, fRS−fLS, of the mixed signal.

• 출원번호 : 18668764
• 출원인 : RTX Corporation
• 특허번호 :
• IPC : G01N-021/88(2006.01);G01N-015/10(2006.01);G02B-006/38(2006.01);

The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.

• 출원번호 : 18668864
• 출원인 : Clark, Benjamin L.
• 특허번호 :
• IPC : C07F-007/22(2006.01);G03F-007/004(2006.01);G03F-007/20(2006.01);

A lithographic apparatus includes a projection system and an inspection system that includes a radiation system, a photonic integrated circuit system, and a detector system. The projection system projects an image of a patterning device onto a substrate. The radiation system directs radiation toward a target on the substrate to generate scattered radiation from the target. The radiation system includes a radiation source to generate radiation and an optical system to focus the radiation on the target. The photonic integrated circuit system includes a waveguide system integrated on a board and a radiation coupler disposed at a waveguide of the waveguide system. The radiation coupler launches at least a portion of the scattered radiation into the waveguide system. The detector system receives the scattered radiation from the waveguide system and generates a measurement signal based on the scattered radiation.

• 출원번호 : EP2024/063865
• 출원인 : ASML NETHERLANDS B.V.
• 특허번호 :
• IPC : G03F-007/00(2006.01);G01M-011/00(2006.01);G01N-021/95(2006.01);G01N-021/956(2006.01);G02B-006/124(2006.01);G03F-009/00(2006.01);

A rock true-triaxial testing system based on computerized tomography (CT) scanning aims to solve problems in the prior art, that is, the rigidity of the frame in the testing system is insufficient; high-pressure lines, wires, and signal lines are entangled when rotating; and the reaction frame and loading actuators obstruct the ray. The rock true-triaxial testing system includes a true-triaxial loading system and a high-energy accelerator-based CT scanning system, where the high-energy accelerator-based CT scanning system is located inside the true-triaxial loading system, and the high-energy accelerator-based CT scanning system is configured to image an internal structure of a cubic rock sample and continuously apply a stress to the cubic rock sample through a plurality of piston extension rods in the true-triaxial loading system. The rock true-triaxial testing system reduces radiation attenuation, and ensures imaging quality and a stable and smooth loading process.

• 출원번호 : 18668176
• 출원인 : INSTITUTE OF GEOLOGY AND GEOPHYSICS, CHINESE ACADEMY OF SCIENCES
• 특허번호 : 12085540
• IPC : G01N-003/12(2006.01);G01N-003/02(2006.01);G01N-023/046(2018.01);G01N-033/24(2006.01);

A UVC sterilization device designed for effective surface disinfection using ultraviolet radiation. The device features motion sensors to detect activity and control the UVC sanitation cycle, photovoltaic cells for energy efficiency, and batteries for power storage. Reflective technology and adjustable deflectors enhance the device's sterilization capability. The device can be mounted on multiple surfaces and includes a override switch. The devices motion sensor controls stop sanitation cycle when motion is detected and activate a new cycle when motion ceases.

• 출원번호 : IB2024/054847
• 출원인 : PATE, John;ELECTROLIPS LLC;TRAUSTI, Thor;
• 특허번호 :
• IPC : A61L-002/10(2006.01);A61L-002/24(2006.01);

The invention relates to an optical processing device (DR) for optically processing incident light radiation (I0) that has propagated through free space and whereof the phase front is liable to be distorted. The optical processing device (DR) comprises a modal conversion device (M) configured to decompose at least one portion of the incident light radiation (I0) into at least two elementary light radiations (R-R) and an integrated photonic device (C) configured to coherently recombine the at least two elementary light radiations (R-R) and produce, over an output optical port (P2), at least one recombined light radiation (R). The elementary light radiations (R-R) propagate, respectively, between an input optical port (P1) and an output optical port (P2) along at least two separate optical paths. The optical processing device (DR) is characterised in that at least one of the optical paths comprises at least one static delay element (D1, D2, D3) configured to equalise the propagation time of the elementary light radiations along the optical paths.

• 출원번호 : EP2024/063808
• 출원인 : CAILABS
• 특허번호 :
• IPC : H04B-010/112(2013.01)

A radiographic imaging apparatus of the present disclosure comprises: an image output unit for outputting a first radiographic image included in continuous radiographic images acquired by means of radiography of a subject; an image brightness information extraction unit for acquiring brightness information from the first radiographic image; a first radiation condition calculation unit for determining a first radiation condition on the basis of the brightness information; a radiation control unit for controlling a radiation dose on the basis of the first radiation condition; a second radiation condition calculation unit for, if the photographed part of the subject is fixed, determining a second radiation condition on the basis of a second radiographic image generated on the basis of the first radiation condition; and a dose reduction unit for reducing or maintaining the radiation dose on the basis of the second radiation condition.

• 출원번호 : KR2024/095796
• 출원인 : DRTECH CORPORATION
• 특허번호 :
• IPC : A61B-006/00(2006.01);A61B-006/58(2024.01);

A method and system tor laser welding a workpiece. The system may include a laser source emitting processing laser radiation, an OCT system that includes an imaging light source emitting imaging light and is configured to generate an interferometric output, a laser head configured to direct processing laser radiation and a beam of the imaging light onto the workpiece, at least one scanner configured to direct the beam of imaging light along at least one measurement weld path, on the workpiece, and at least one controIler configured to: receive data corresponding to a reference weld path on the workpiece, generate a corrected weld path, based at least in part on a comparison between the interferometric output of the at least one measurement weld path and the reference weld path, and control the laser head such that the processing laser radiation is directed along the corrected weld path on the workpiece.

• 출원번호 : US2024/029883
• 출원인 : IPG PHOTONICS CORPORATION
• 특허번호 :
• IPC : B23K-026/03(2006.01);B23K-026/21(2014.01);B23K-026/082(2014.01);G06N-020/00(2019.01);