A sensor for detecting the surroundings, comprising a signal exchange unit, a power supply, a sensor housing, a transmitter, and a receiver, wherein the transmitter and the receiver are arranged in the sensor housing, wherein the transmitter is designed to emit a measuring radiation into the surroundings, wherein the receiver is designed to receive a reflection radiation from the surroundings, wherein the power supply is arranged to supply the transmitter and the receiver with power, wherein the signal exchange unit is connected to the receiver and the transmitter for signal exchange, wherein the signal exchange unit is arranged to exchange signals with a counter-signal exchange unit, and the sensor housing can be mechanically connected to a receiving unit in a tool-free, non-destructive and detachable manner.

• 출원번호 : 18671101
• 출원인 : Schaeuble, Michael
• 특허번호 :
• IPC : G01S-007/02(2006.01);G01S-007/40(2006.01);G01S-013/931(2006.01);

An optical fiber-based sensing membrane includes at least one optical fiber, and a substrate. The at least one optical fiber is integrated in the substrate. The substrate includes a thickness and a material property that are specified to ascertain, via the at least one optical fiber and for a device that is contiguously engaged with a surface of the substrate, includes the substrate embedded in the device, or includes the surface of the substrate at a predetermined distance from the device, a thermal property or a mechanical property associated with the device, or a radiation level associated with a device environment.

• 출원번호 : 18671411
• 출원인 : VIAVI SOLUTIONS INC.
• 특허번호 :
• IPC : G01H-009/00(2006.01);B60L-058/18(2006.01);G01D-021/02(2006.01);G01K-011/32(2006.01);G01K-011/3206(2006.01);G01K-011/322(2006.01);G01K-011/324(2006.01);G01K-015/00(2006.01);G01L-001/24(2006.01);G01L-025/00(2006.01);G02B-006/12(2006.01);G02B-006/13(2006.01);

Methods for reducing charge on a contaminated surface of an ion optical system having a layer of charged contaminant thereon comprise generating charged particles by exciting a radiation source that is distinct from the contaminated surface and neutralising at least a portion of the layer of charged contaminant by causing the charged particles to interact with the layer of charged contaminant. The radiation source comprises an electromagnetic radiation source that emits electromagnetic radiation, and generating the charged particles comprises causing the electromagnetic radiation to interact with the layer of charged contaminant and/or the ion optical system to generate the charged particles; and/or (ii) the radiation source comprises an electron source that emits free electrons. Ion optical systems are configured to reduce charge on a contaminated surface of the ion optical system.

• 출원번호 : 18671085
• 출원인 : Thermo Fisher Scientific (Bremen) GmbH
• 특허번호 :
• IPC : H01J-049/06(2006.01);G21K-005/00(2006.01);

A capability determination method includes: acquiring an imaging capability from an image obtained by a radiation detector by irradiation of a model with radiation; and outputting the acquired imaging capability in such a manner as to indicate a relation with a required imaging capability for a predetermined dynamic analysis.

• 출원번호 : 18671271
• 출원인 : TAKAGI, Tatsuya
• 특허번호 :
• IPC : A61B-006/58(2006.01);A61B-006/50(2006.01);

The present invention relates to the technical field of chemistry, and in particular relates to a compound, and a preparation method therefor and the use thereof. The compound has a general structural formula as shown in formula I-1 or I-2: wherein R and R are each independently selected from C(CF), CH(CF) and CHCF; R, R, R, and R are each independently selected from a benzoindole salt, an indole-like salt, a benzoindole salt, and an indole salt; and n and n are each independently selected from 1-5. The compound of the present invention can be applied to nuclear magnetic resonance imaging. The compound of the present invention can be used for fluorescence-magnetic resonance dual imaging, wherein fluorescence imaging can be used for intraoperative marking, and magnetic resonance imaging can be used for preoperative diagnosis.

• 출원번호 : CN2024/094647
• 출원인 : SHANGHAI NINTH PEOPLE'S HOSPITAL, SHANGHAI JIAOTONG UNIVERSITY SCHOOL OF MEDICINE
• 특허번호 :
• IPC : C07D-209/60(2006.01);C07D-209/14(2006.01);C07D-209/56(2006.01);C09K-011/06(2006.01);C09B-023/10(2006.01);A61K-049/00(2006.01);A61K-049/10(2006.01);

A radar system uses multiple nulls to improve detection capabilities. Multiple radar pulses are transmitted and or received, each with a different null pattern. The returns from each pulse are averaged together to form a null window that is less noisy and potentially wider than a single null pattern. This approach can improve the signal-to-noise ratio and make it easier to detect objects of interest. The system may generate individual pulses from an AESA divided into several subarrays. Each subarray produces a pulse with a null in a different location in the radiation pattern centered about a location of interest. The contemporaneous return signals are averaged together.

• 출원번호 : 24177252.4
• 출원인 : Rockwell Collins, Inc.
• 특허번호 :
• IPC : G01S-007/02(2006.01);G01S-007/28(2006.01);G01S-007/40(2006.01);H01Q-003/38(2006.01);

An apparatus for inactivating a pathogen in air. The apparatus has an air stream housing integrated with a far-UV radiation source. The air stream housing includes a mechanical filter, a scrubber, or both, and a fan system provides an air stream through the air stream housing. The far-UV radiation source is integrated with the air stream unit external to the air flow chamber and adjacent to at least one of the air intake or air exhaust, and the far-UV radiation source is positioned to direct radiation away from the air stream housing. A system and method for inactivating a pathogen in air are also described.

• 출원번호 : US2024/030579
• 출원인 : THE OSLUV PROJECT;COLLINS, Aaron;PANG, Chia Hua M;GOESSLING, Louis;LIBBY, Christopher Richard Saline;ANDREASEN, Rachel;
• 특허번호 :
• IPC : A61L-002/08(2006.01);A61L-002/10(2006.01);A61L-002/26(2006.01);A61L-009/18(2006.01);A61L-009/20(2006.01);A61L-002/02(2006.01);

A process system for processing a substrate is proposed, comprising at least one irradiation device for irradiating a substrate, wherein the substrate is fed in at an entry region of the irradiation device and is guided in a predefined process direction and is loaded with radiation energy and process air, and wherein the substrate leaves the irradiation device at an exit region, and a circulating air nozzle dryer which is arranged so as to adjoin the exit region of the irradiation device in the process direction and to which the substrate is fed after leaving the irradiation device, and wherein the substrate runs through said dryer as far as a discharge region, wherein the circulating air nozzle dryer is configured to process the substrate, and wherein the circulating air nozzle dryer comprises: at least a first and a second circulating air module, each comprising an extraction unit and a feed air nozzle, and an air circulation element which is operatively connected to the at least two circulating air modules and is arranged and configured to circulate air received by the extraction unit of at least the first circulating air module and fed in to the former, and at least one heating element which is arranged and configured to control the temperature of the circulated air and to output it as feed air through the feed air nozzles of the circulating air modules in the direction of the substrate, wherein the last extraction unit in the process direction is not operatively connected to the air circulation element, and is configured to transport part of the feed air, output onto the substrate, to outside the circulating air system.

• 출원번호 : DE2024/100474
• 출원인 : ACKERMANN, Gunther
• 특허번호 :
• IPC : B41F-023/04(2006.01);F26B-003/28(2006.01);F26B-003/30(2006.01);F26B-013/10(2006.01);F26B-021/04(2006.01);F26B-021/10(2006.01);F26B-021/12(2006.01);F26B-023/00(2006.01);

Back-illuminated DUV/VUV/EUV radiation or charged particle image sensors are fabricated using a method that utilizes a plasma atomic layer deposition (plasma ALD) process to generate a thin pinhole-free pure boron layer over active sensor areas. Circuit elements are formed on a semiconductor membrane's frontside surface, and then an optional preliminary hydrogen plasma cleaning process is performed on the membrane's backside surface. The plasma ALD process includes performing multiple plasma ALD cycles, with each cycle including forming an adsorbed boron precursor layer during a first cycle phase, and then generating a hydrogen plasma to convert the precursor layer into an associated boron nanolayer during a second cycle phase. Gasses are purged from the plasma ALD process chamber after each cycle phase. The plasma ALD cycles are repeated until the resulting stack of boron nanolayers has a cumulative stack height (thickness) that is equal to a selected target thickness.

• 출원번호 : 18671172
• 출원인 : KLA Corporation
• 특허번호 :
• IPC : H01L-027/146(2006.01);G03F-007/00(2006.01);

The disclosure features methods of analyzing a fluid extracted from a reservoir, the methods including introducing a first composition featuring a first complexing agent into a reservoir at a first location, extracting a fluid from the reservoir at a second location different from the first location, combining the fluid with a second composition featuring a concentration of a lanthanide ion to form a third composition featuring a concentration of a complex formed by the first complexing agent and the lanthanide ion, exposing a quantity of the complex to electromagnetic radiation for a first time period ending at a time t0, detecting fluorescence emission from the quantity of the complex for a second time period starting at a time t1t0, where t1−t0 is greater than 2 microseconds, and determining information about a fluid flow path between the first location and the second location.

• 출원번호 : 18671211
• 출원인 : Ow, Hooisweng
• 특허번호 :
• IPC : C07D-213/55(2006.01);C07D-213/79(2006.01);C07D-213/89(2006.01);C07D-401/04(2006.01);C07D-471/04(2006.01);C09K-008/03(2006.01);C09K-011/07(2006.01);E21B-043/16(2006.01);E21B-047/11(2006.01);E21B-049/08(2006.01);G01N-021/64(2006.01);