Provided is a method of filling a gap with a flowable oxide film. In one embodiment of the disclosure, the method comprises forming a flowable silicon nitride film, followed by converting the silicon nitride film in a silicon oxide film. The silicon nitride film may be formed by supplying an oligomeric silicon source and a nitrogen source activated by a power. The silicon nitride film may be converted into the silicon oxide film by supplying an oxygen source while applying a vacuum UV radiation. The vacuum UV radiation may be applied in a pulsed mode.

• 출원번호 : 18795432
• 출원인 : Kim, KiHun
• 특허번호 :
• IPC : H01L-021/02(2006.01);C23C-016/34(2006.01);C23C-016/505(2006.01);C23C-016/56(2006.01);

A hybrid antenna structure includes a ground element, a feeding radiation element, a first radiation element, a second radiation element, a first connection radiation element, a second connection radiation element, a shorting radiation element, a third radiation element, and an integrated module. The ground element provides a ground voltage. The feeding radiation element has a feeding point. The second radiation element is coupled to the feeding radiation element. The first radiation element is coupled through the first connection radiation element and the second connection radiation element to the second radiation element. The second radiation element is also coupled through the shorting radiation element to the ground voltage. The third radiation element is adjacent to the second radiation element. The integrated module is coupled to the third radiation element. The integrated module has the functions of circuit adjustment and proximity sense.

• 출원번호 : 18795798
• 출원인 : KUO, Li-Kai
• 특허번호 :
• IPC : H01Q-009/04(2006.01);H01Q-021/30(2006.01);

A processor is configured to: acquire a first radiation image including a tubular structure before an injection of a contrast agent and a second radiation image including the tubular structure during the injection of the contrast agent or after the injection of the contrast agent; derive a processed first radiation image by removing a scattered ray component included in the first radiation image; derive a processed second radiation image by removing a scattered ray component included in the second radiation image based on the scattered ray component of the first radiation image; and derive a difference image between the processed first radiation image and the processed second radiation image.

• 출원번호 : 18795201
• 출원인 : HAMAUZU, Shin
• 특허번호 :
• IPC : G06T-005/70(2006.01);A61B-006/00(2006.01);G06T-005/50(2006.01);

A radiation-sensitive resin composition includes: a polymer comprising a structural unit (I) represented by a formula (1) and a structural unit different from the structural unit (I); a radiation-sensitive acid generator represented by a formula (α); and a solvent. RK1 is a hydrogen atom, a fluorine atom, or the like, L1 is an alkanediyl group, and Rf1 is a fluorinated hydrocarbon group. RW is a monovalent organic group having 3 to 40 carbon atoms that contains a cyclic structure, Rfa and Rfb are each independently a fluorine atom or the like, R11 and R12 are each independently a hydrogen atom, a fluorine atom, or the like, n1 is an integer of 1 to 4, n2 is an integer of 0 to 4, no carbonyl group is present between a sulfur atom of the sulfonic acid ion and the cyclic structure of RW, and Z+ is a monovalent onium cation.

• 출원번호 : 18795534
• 출원인 : JSR CORPORATION
• 특허번호 :
• IPC : G03F-007/039(2006.01);C08F-220/28(2006.01);C08F-220/36(2006.01);G03F-007/004(2006.01);G03F-007/038(2006.01);

A method and system for calibrating nuclear instrumentation of a reactor is disclosed. The system comprises a reactor configured to operate at a low power level and an external heater configured to heat the reactor to its operating temperature and maintain the reactor in a critical state. The reactor maintains its temperature at a steady state by repeating steps of reducing the heater's power and increasing the reactor's power by changing one or more reactivity settings, wherein the reduced heater's power is compensated by using the increased power generated by the reactor itself. The nuclear instrumentation is configured to measure the reactor's output power and compare it with the calculated reactor's power. Based on the discrepancy between the calculated power and the measured power exceeds a threshold; and the nuclear instrumentation is appropriately calibrated by adjusting one or more settings.

• 출원번호 : US2024/041094
• 출원인 : ABILENE CHRISTIAN UNIVERSITY;GEORGIA TECH RESEARCH CORPORATION;THE TEXAS A&M UNIVERSITY SYSTEM;BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM;
• 특허번호 :
• IPC : G21C-017/025(2006.01)

The invention relates to an interventional system comprising an introduction element like a catheter for being introduced into an object, for instance, a person. A moving unit like a robot moves the introduction element within the object, wherein a tracking image generating unit generates tracking images of the introduction element within the object and wherein a controller controls the tracking image generating unit depending on movement parameters of the moving unit, which are indicative of the movement, such that the tracking images show the introduction element. This control can be performed very accurately based on the known real physical movement of the introduction element such that it is not necessary to, for instance, irradiate a relatively large area of the object for ensuring that the introduction element is really captured by the tracking images, thereby allowing for a reduced radiation dose applied to the object.

• 출원번호 : 18795287
• 출원인 : VAN DIJK, ERIK MARTINUS HUBERTUS PETRUS
• 특허번호 :
• IPC : A61B-006/00(2006.01);A61B-006/06(2006.01);A61B-006/12(2006.01);A61B-006/50(2006.01);A61B-034/20(2006.01);A61B-034/30(2006.01);A61B-090/00(2006.01);

The chemically amplified resist composition is excellent in LWR and resolution and can prevent a resist pattern from collapsing in photolithography using high-energy radiation, such as far ultraviolet lithography, EUV lithography, and electron beam (EB) lithography, an onium salt for use therein. The chemically amplified resist composition can form a pattern by using it. The onium salt has the following formula (1).

• 출원번호 : 18795308
• 출원인 : Shin-Etsu Chemical Co., Ltd.
• 특허번호 :
• IPC : G03F-007/004(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);

A method and system for calibrating nuclear instrumentation of a reactor is disclosed. The system comprises a reactor configured to operate at a low power level and an external heater configured to heat the reactor to its operating temperature and maintain the reactor in a critical state. The reactor maintains its temperature at a steady state by repeating steps of reducing the heater's power and increasing the reactor's power by changing one or more reactivity settings, wherein the reduced heater's power is compensated by using the increased power generated by the reactor itself. The nuclear instrumentation is configured to measure the reactor's output power and compare it with the calculated reactor's power. Based on the discrepancy between the calculated power and the measured power exceeds a threshold; and the nuclear instrumentation is appropriately calibrated by adjusting one or more settings.

• 출원번호 : 18795873
• 출원인 : Kelly, Ryan
• 특허번호 :
• IPC : G21C-017/108(2006.01);G01T-003/00(2006.01);G01T-007/00(2006.01);

A radiation-curable composition includes at least one monofunctional monomer and/or at least one multifunctional monomer, at least one photoinitiator compound, and at least one matting agent, wherein the at least one matting agent is at least one aminoplast resin. Methods of producing the radiation-curable composition, methods of coating a substrate with the radiation-curable composition, and substrates coated with the radiation-cured composition are also disclosed.

• 출원번호 : 18795681
• 출원인 : Marabu GmbH & Co. KG
• 특허번호 :
• IPC : C08F-220/18(2006.01);B05D-005/02(2006.01);C08F-002/44(2006.01);C08F-002/50(2006.01);C08L-075/02(2006.01);C08L-075/04(2006.01);

• 출원번호 : 24193187.2
• 출원인 : Sangle-Ferriere, Bruno
• 특허번호 :
• IPC : G21G-001/06(2006.01);G21G-004/02(2006.01);