Provided are: a radiation-sensitive composition that makes it possible to achieve substantial sensitivity, LWR performance, DOF performance, pattern rectangularity, CDU performance, and pattern circularity when a resist pattern is formed; a pattern formation method; and an onium salt compound. A radiation-sensitive composition according to the present invention includes an onium salt compound represented by formula (1), a polymer that includes a structural unit that has an acid-dissociable group, and a solvent. (In formula (1), A is a C1–40 monovalent organic group, R and R are each independently a hydrogen atom, a C1–20 monovalent fluorine-free organic group, a cyano group, a nitro group, a hydroxyl group, or an amino group, each of the Rs and Rs being the same or different when there are a plurality of Rs and Rs, m is an integer from 1 to 8, inclusive, and Z is a monovalent radiation-sensitive onium cation.)
- 출원번호 : JP2024/019163
- 출원인 : JSR CORPORATION
- 특허번호 :
- IPC : G03F-007/004(2006.01);C07C-317/10(2006.01);C07C-317/12(2006.01);C07C-317/14(2006.01);C07C-317/18(2006.01);C07C-317/44(2006.01);C07C-381/12(2006.01);C07D-307/00(2006.01);C07D-307/33(2006.01);C07D-317/08(2006.01);C07D-317/72(2006.01);C07D-321/10(2006.01);C07D-327/06(2006.01);C07D-333/16(2006.01);C07D-493/18(2006.01);C08F-002/06(2006.01);C08F-220/18(2006.01);G03F-007/20(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);