An antenna device includes: a first dielectric substrate that includes a first surface; a second dielectric substrate that faces the first dielectric substrate; a plurality of first radiation elements that is provided over the first surface; a power feeding unit that feeds power to the first radiation elements; a plurality of second radiation elements that is provided over a second surface of the second dielectric substrate and coupled to the plurality of first radiation elements; and through holes that are formed around the plurality of second radiation elements of the second dielectric substrate in plan view. The plurality of first radiation elements is a plurality of antenna elements for a patch antenna.

• 출원번호 : 18785047
• 출원인 : Fujitsu Limited
• 특허번호 :
• IPC : H01Q-021/06(2006.01);H01Q-001/50(2006.01);

An exposure tool is configured to remove contaminants and/or prevent contamination of mirrors and/or other optical components included in the exposure tool. In some implementations, the exposure tool is configured to flush and/or otherwise remove contaminants from an illuminator, a projection optics box, and/or one or more other subsystems of the exposure tool using a heated gas such as ozone (O3) or extra clean dry air (XCDA), among other examples. In some implementations, the exposure tool is configured to provide a gas curtain (or gas wall) that includes hydrogen (H2) or another type of gas to reduce the likelihood of contaminants reaching the mirrors included in the exposure tool. In this way, the mirrors and one or more other components of the exposure tool are cleaned and maintained in a clean environment in which radiation absorbing contaminants are controlled to increase the performance of the exposure tool.

• 출원번호 : 18785022
• 출원인 : CHANG, Kai-Chieh
• 특허번호 :
• IPC : G03F-007/00(2006.01);G02B-005/08(2006.01);

The present invention generally relates to a method (34) for controlling a drying procedure of a printed product and an industrial printing machine (10). The printed product is manufactured by the industrial printing machine (10). An image to be printed is split into several image cells. For each image cell a total amount of ink to be used and an average lightness value of the ink to be printed within the respective image cell are determined. For each image cell a cell-dependent amount of infrared radiation to be applied for drying the ink to be used within the respective image cell is determined based on the total amount of ink to be used and the average lightness value determined in view of the respective image cell. A mixture of the drying procedure to be applied for drying the ink to be used within the image to be printed is determined based at least on the cell-dependent amounts of infrared radiation to be applied and a moving speed of the printed product. The mixture comprises at least a ratio of an overall amount of infrared radiation and an overall amount of convective heating.

• 출원번호 : 18785194
• 출원인 : BOBST MEX SA
• 특허번호 :
• IPC : B41J-011/00(2006.01);G06K-015/00(2006.01);G06K-015/02(2006.01);

In a pattern formation method, a photoresist layer is formed over a substrate by combining a first precursor and a second precursor in a vapor state to form a photoresist material. The first precursor is an organometallic having a formula MaRbXc, where M is one or more selected from the group consisting of Sn, Bi, Sb, In, and Te, R is an alkyl group that is substituted by different EDG and/or EWG, X is a halide or sulfonate group, and 1≤a≤2, b≥1, c≥1, and b+c≤4. The second precursor is water, an amine, a borane, and/or a phosphine. The photoresist material is deposited over the substrate, and selectively exposed to actinic radiation to form a latent pattern, and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a pattern.

• 출원번호 : 18786266
• 출원인 : Taiwan Semiconductor Manufacturing Company, Ltd.
• 특허번호 :
• IPC : H01L-021/027(2006.01);C23C-016/04(2006.01);C23C-016/455(2006.01);

A method of manufacturing a semiconductor device includes forming a photoresist layer over a substrate, including combining a first precursor and a second precursor in a vapor state to form a photoresist material, and depositing the photoresist material over the substrate. A protective layer is formed over the photoresist layer. The photoresist layer is selectively exposed to actinic radiation through the protective layer to form a latent pattern in the photoresist layer. The protective layer is removed, and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a pattern.

• 출원번호 : 18785179
• 출원인 : Taiwan Semiconductor Manufacturing Company, Ltd.
• 특허번호 :
• IPC : G03F-007/004(2006.01);G03F-007/00(2006.01);H01L-021/033(2006.01);

Semiconductor devices and corresponding methods of manufacture are disclosed. The method includes forming a first device structure on a first substrate, a first laser liftoff layer on the first device structure, a protective layer on the first laser liftoff layer, and a second substrate on the protective layer. The method includes de-attaching, through applying radiation on the first laser liftoff layer, the protective layer from the first laser liftoff layer, with a first surface of the second substrate remaining in contact with a second surface of the protective layer. The protective layer is transparent to the radiation.

• 출원번호 : 18786164
• 출원인 : JAIPAN, Panupong
• 특허번호 :
• IPC : H01L-021/02(2006.01);H01L-021/306(2006.01);

The invention relates to a method for producing an ophthalmological device (1), having the steps of: providing a container (30) which is transparent to electromagnetic radiation (35), providing at least one first part (10) of the ophthalmological device (1), securing the at least one first part (10) in the container (30) using at least one holding device (31), and for at least one second part (12) of the ophthalmological device (1): providing a liquid (33), which can be cured using electromagnetic radiation (35), in the container (30); generating and/or providing a data set (36) of images (37) of the second part (12) of the ophthalmological device (1), said images (37) containing projections of the second part (12) from different directions; and - tomographically printing the curable liquid (33) using electromagnetic radiation (35) on the basis of the generated and/or provided data set (36) in order to produce the second part (12). The step of generating and/or providing the data set (36) and/or tomographically printing the curable liquid is carried out such that at least one second part (12) is arranged on the at least one first part (10) and/or at least partly surrounds same. The invention additionally relates to an assembly (20).

• 출원번호 : EP2024/071112
• 출원인 : CARL ZEISS MEDITEC AG
• 특허번호 :
• IPC : B29C-064/124(2017.01);B29C-064/245(2017.01);B33Y-010/00(2015.01);B33Y-030/00(2015.01);B33Y-040/00(2020.01);B29D-011/00(2006.01);

A nuclear magnetic resonance tube (100) is disclosed, sized for fitting within an NMR machine (101). It comprises a semi-permeable membrane (105) located within the NMR tube (100) for providing a semi-permeable boundary between first a sample region (103) within the NMR tube (100) and a second sample region (104) within the NMR tube (100). The first sample region (103) is configured for holding a first sample. The second sample region (104) is configured for holding a second sample.

• 출원번호 : EP2024/071198
• 출원인 : UNIVERSITETET I TROMSØ- NORGES ARKTISKE UNIVERSITET;
• 특허번호 :
• IPC : G01N-024/08(2006.01);G01R-033/30(2006.01);

The invention relates to a method for producing an intraocular lens (5), having the steps of providing a container (1) which is transparent to electromagnetic radiation (3); providing a liquid (2), which can be cured using electromagnetic radiation (3), in the container (1); generating and/or providing a data set (4) of images of an intraocular lens (5) with at least one cavity (6), wherein the images contain projections of the intraocular lens (5) with the at least one cavity (6) from different directions; tomographically printing the curable liquid (2) using electromagnetic radiation (3) on the basis of the generated and/or provided data set (4) in order to produce the intraocular lens (5) with the at least one cavity (6); and deactivating the ability to cure the curable liquid (2) in the at least one cavity (6). The invention additionally relates to an assembly (10) for producing an intraocular lens (5).

• 출원번호 : EP2024/071100
• 출원인 : CARL ZEISS MEDITEC AG
• 특허번호 :
• IPC : B29D-011/00(2006.01);B29D-011/02(2006.01);B33Y-010/00(2015.01);B33Y-030/00(2015.01);B33Y-050/00(2015.01);B33Y-080/00(2015.01);B29C-064/124(2017.01);

The present disclosure relates to an intermediate substrate (10) for the manufacture of a semiconductor substrate, the intermediate substrate successively comprising: a a first semiconductor layer (2); b a first thermal barrier layer (5); c a support (13) comprising an absorption layer (3) configured to absorb laser radiation in a given wavelength range, the temperature of the absorption layer (3) increasing as it absorbs the laser radiation, and a separation zone (8) adjacent to the absorption layer (3) configured to thermally degrade due to the increase in temperature of the absorption layer, so as to separate at least part of the support (13) from the rest of the intermediate substrate (10).

• 출원번호 : EP2024/071217
• 출원인 : SOITEC
• 특허번호 :
• IPC : H01L-021/02(2006.01);C30B-033/06(2006.01);H01L-021/762(2006.01);H01L-021/683(2006.01);