Provided is a radiation-sensitive composition and a pattern formation method with which sensitivity, LWR performance, pattern rectangularity, CDU performance, pattern circularity, MEEF, and exposure margin can be exhibited at a sufficient level when a pattern is formed. This radiation-sensitive resin composition comprises: a first onium salt compound represented by formula (1), a second onium salt compound represented by formula (2), a polymer containing structural units having an acid-dissociable group, and a solvent. (In formula (1), A is a C1–C40 (1+n)-valent organic group. R and R are each independently a hydrogen atom, a C1–C20 monovalent organic group, a fluorine atom, or a monovalent fluorinated hydrocarbon group. When both R and R are present in pluralities, the plurality of R and R are the same as or different from each other. At least one of R and R is a fluorine atom or a monovalent fluorinated hydrocarbon group. R and R are each independently a hydrogen atom, a fluorine atom, or a C1–C20 monovalent organic group. When both R and R are present in pluralities, the plurality of R and R are the same as or different from each other. m1 is an integer of 1 to 4. m2 is an integer of 0 to 4. n is an integer of 1 to 3. Z is a monovalent radiation-sensitive onium cation. There are no more than eight fluorine atoms in Z .) (In formula (2), R is a C1–C40 monovalent organic group in which a fluorine atom or a fluorinated hydrocarbon group is not bonded to an atom adjacent to the sulfur atom in SO . Z is a monovalent organic cation.)
- 출원번호 : JP2024/032896
- 출원인 : JSR CORPORATION
- 특허번호 :
- IPC : G03F-007/004(2006.01);C08F-020/26(2006.01);G03F-007/20(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);