A hybrid antenna structure includes a ground element, a feeding radiation element, a first radiation element, a second radiation element, a first connection radiation element, a second connection radiation element, a shorting radiation element, a third radiation element, and an integrated module. The ground element provides a ground voltage. The feeding radiation element has a feeding point. The second radiation element is coupled to the feeding radiation element. The first radiation element is coupled through the first connection radiation element and the second connection radiation element to the second radiation element. The second radiation element is also coupled through the shorting radiation element to the ground voltage. The third radiation element is adjacent to the second radiation element. The integrated module is coupled to the third radiation element. The integrated module has the functions of circuit adjustment and proximity sense.

• 출원번호 : 18795798
• 출원인 : KUO, Li-Kai
• 특허번호 :
• IPC : H01Q-009/04(2006.01);H01Q-021/30(2006.01);

A method and system for calibrating nuclear instrumentation of a reactor is disclosed. The system comprises a reactor configured to operate at a low power level and an external heater configured to heat the reactor to its operating temperature and maintain the reactor in a critical state. The reactor maintains its temperature at a steady state by repeating steps of reducing the heater's power and increasing the reactor's power by changing one or more reactivity settings, wherein the reduced heater's power is compensated by using the increased power generated by the reactor itself. The nuclear instrumentation is configured to measure the reactor's output power and compare it with the calculated reactor's power. Based on the discrepancy between the calculated power and the measured power exceeds a threshold; and the nuclear instrumentation is appropriately calibrated by adjusting one or more settings.

• 출원번호 : 18795873
• 출원인 : Kelly, Ryan
• 특허번호 :
• IPC : G21C-017/108(2006.01);G01T-003/00(2006.01);G01T-007/00(2006.01);

A radiation-curable composition includes at least one monofunctional monomer and/or at least one multifunctional monomer, at least one photoinitiator compound, and at least one matting agent, wherein the at least one matting agent is at least one aminoplast resin. Methods of producing the radiation-curable composition, methods of coating a substrate with the radiation-curable composition, and substrates coated with the radiation-cured composition are also disclosed.

• 출원번호 : 18795681
• 출원인 : Marabu GmbH & Co. KG
• 특허번호 :
• IPC : C08F-220/18(2006.01);B05D-005/02(2006.01);C08F-002/44(2006.01);C08F-002/50(2006.01);C08L-075/02(2006.01);C08L-075/04(2006.01);

The chemically amplified resist composition is excellent in LWR and resolution and can prevent a resist pattern from collapsing in photolithography using high-energy radiation, such as far ultraviolet lithography, EUV lithography, and electron beam (EB) lithography, an onium salt for use therein. The chemically amplified resist composition can form a pattern by using it. The onium salt has the following formula (1).

• 출원번호 : 18795308
• 출원인 : Shin-Etsu Chemical Co., Ltd.
• 특허번호 :
• IPC : G03F-007/004(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);

The invention relates to an interventional system comprising an introduction element like a catheter for being introduced into an object, for instance, a person. A moving unit like a robot moves the introduction element within the object, wherein a tracking image generating unit generates tracking images of the introduction element within the object and wherein a controller controls the tracking image generating unit depending on movement parameters of the moving unit, which are indicative of the movement, such that the tracking images show the introduction element. This control can be performed very accurately based on the known real physical movement of the introduction element such that it is not necessary to, for instance, irradiate a relatively large area of the object for ensuring that the introduction element is really captured by the tracking images, thereby allowing for a reduced radiation dose applied to the object.

• 출원번호 : 18795287
• 출원인 : VAN DIJK, ERIK MARTINUS HUBERTUS PETRUS
• 특허번호 :
• IPC : A61B-006/00(2006.01);A61B-006/06(2006.01);A61B-006/12(2006.01);A61B-006/50(2006.01);A61B-034/20(2006.01);A61B-034/30(2006.01);A61B-090/00(2006.01);

A radiation-sensitive resin composition includes: a polymer comprising a structural unit (I) represented by a formula (1) and a structural unit different from the structural unit (I); a radiation-sensitive acid generator represented by a formula (α); and a solvent. RK1 is a hydrogen atom, a fluorine atom, or the like, L1 is an alkanediyl group, and Rf1 is a fluorinated hydrocarbon group. RW is a monovalent organic group having 3 to 40 carbon atoms that contains a cyclic structure, Rfa and Rfb are each independently a fluorine atom or the like, R11 and R12 are each independently a hydrogen atom, a fluorine atom, or the like, n1 is an integer of 1 to 4, n2 is an integer of 0 to 4, no carbonyl group is present between a sulfur atom of the sulfonic acid ion and the cyclic structure of RW, and Z+ is a monovalent onium cation.

• 출원번호 : 18795534
• 출원인 : JSR CORPORATION
• 특허번호 :
• IPC : G03F-007/039(2006.01);C08F-220/28(2006.01);C08F-220/36(2006.01);G03F-007/004(2006.01);G03F-007/038(2006.01);

An image sensor (10) comprises a semiconductor substrate (100) comprising a photodiode (105) comprising a first doped portion (111) of a first conductivity type and a second doped portion (112) of a second conductivity type. The image sensor (10) further comprises a transfer gate (107) for transferring charges from the second doped portion (112) to a floating diffusion portion (108). The transfer gate (107) and the floating diffusion portion (108) are arranged at a first main surface (101) of the semiconductor substrate (100) opposite to a second main surface (102) being an incidence surface for electromagnetic radiation (15). The transfer gate (107) comprises a gate trench (114) extending from the first main surface (101) in a depth direction. The image sensor (10) further comprises a reflecting metasurface (117) at the first main surface (101) of the semiconductor substrate (100).

• 출원번호 : EP2024/072211
• 출원인 : AMS SENSORS BELGIUM BVBA
• 특허번호 :
• IPC : H01L-027/146(2006.01)

The invention relates to a device (1) for carrying out nuclear reactions comprising:- a source material comprising a first isotope, arranged in a first enclosure,- an ionization system (100) configured for ionizing the source material,- an ion accelerator configured for accelerating ions of the source material to a first target (103) arranged in a second enclosure (102) and comprising a second isotope, so as to allow a first nuclear reaction between the first and the second isotopes,- a second target (110) arranged either in the second or in a third enclosure (109), so as to allow reaction of neutrons resulting from the first nuclear reaction with atomic nuclei of the second target,the first isotope being a hydrogen isotope and the second isotope being a hydrogen isotope or a heavy isotope.

• 출원번호 : 24193187.2
• 출원인 : Sangle-Ferriere, Bruno
• 특허번호 :
• IPC : G21G-001/06(2006.01);G21G-004/02(2006.01);

Provided are: a method for producing an actinic ray-sensitive or radiation-sensitive resin composition, said method including a step (X) for filtering an actinic ray-sensitive or radiation-sensitive resin composition containing a solvent and a resin (A) of which the main chain is decomposed by being irradiated with actinic rays or radiation, and performing the filtering by passing said composition through two or more types of filters; a pattern formation method that uses the method for producing an actinic ray-sensitive or radiation-sensitive resin composition; and a method for producing an electronic device.

• 출원번호 : JP2024/027906
• 출원인 : FUJIFILM CORPORATION
• 특허번호 :
• IPC : G03F-007/039(2006.01);B01D-061/02(2006.01);B01D-061/58(2006.01);B01D-069/00(2006.01);C08F-212/08(2006.01);C08F-212/14(2006.01);C08F-220/18(2006.01);C08F-220/22(2006.01);G03F-007/20(2006.01);

An image forming method for forming an image on a substrate, includes: forming a resin layer on the substrate; adhering a transfer sheet having a sublimable dye ink layer on a surface thereof to the resin layer, the sublimable dye ink layer including a sublimable dye ink; and heating the transfer sheet to transfer the sublimable dye ink to the resin layer. Forming the resin layer includes: ejecting a resin liquid from an inkjet head to adhere the resin liquid to the substrate, the resin liquid including a resin component capable of being polymerized by ultraviolet irradiation; and polymerizing the resin component by ultraviolet radiation to form the resin layer on the substrate.

• 출원번호 : 24192772.2
• 출원인 : Brother Kogyo Kabushiki Kaisha
• 특허번호 :
• IPC : B41M-005/00(2006.01);B41M-005/035(2006.01);B41M-005/52(2006.01);