Described herein, are methods for providing a protective coating to a storage container for storing nuclear material, the method comprising depositing nickel particles on at least one surface of the substrate to produce the protective coating, wherein the nickel particles are deposited by cold spraying a composition comprising nickel particles and a carrier gas comprising nitrogen. In one aspect, the carrier gas consists essentially or consists only of nitrogen. The methods do not require pretreatment or modification of the nickel particles prior to cold spraying, which makes the methods described herein economically practical. The coatings produced by the methods described herein possess several advantageous properties including, but not limited to, high adhesion strength to the storage system and low porosity. The coatings produced by the methods described herein are effective against chemical attack such as, for example, CISCC.

• 출원번호 : 18779178
• 출원인 : Wellwood, Jay G.
• 특허번호 :
• IPC : B05D-001/12(2006.01);B05B-007/14(2006.01);C23C-024/04(2006.01);

A phantom for radiotherapy and/or medical imaging systems. The phantom includes one or more simulated anatomical structures including a tissue mimicking soft material. The phantom further includes a radiosensitive inclusion configured to form a bubble when exposed to radiation. The bubble is detectable via imaging with the medical imaging system.

• 출원번호 : 18780080
• 출원인 : Acoustic Range Estimates, LLC
• 특허번호 :
• IPC : A61B-006/58(2006.01);A61N-005/10(2006.01);

The invention relates: to a method for joining, potting, or coating substrates using a curable compound; to a curable compound; and to a use of the curable compound for joining, potting, or coating substrates. The curable compound comprises: a first curable component (A) and a second curable component (B); a first photoinitiator (C) for the first curable component (A), which first photoinitiator can be activated when irradiated with actinic radiation of a first wavelength λ; a second photoinitiator (D) for the second curable component (B), which second photoinitiator can be activated when irradiated with actinic radiation of a second wavelength λ, the second wavelength λ being different from the first wavelength λ; and at least one radical-scavenging inhibitor (E) for scavenging radicals generated when irradiating the curable compound with actinic radiation of the first wavelength λ. In the method, the curable compound is metered onto a first substrate and activated by irradiating with actinic radiation of the first wavelength λ. The activated curable compound is then fixed by irradiating with actinic radiation of the second wavelength λ. The invention also relates to a curable compound and to a use of a curable compound.

• 출원번호 : EP2024/070709
• 출원인 : DELO INDUSTRIE KLEBSTOFFE GMBH &CO. KGAA;
• 특허번호 :
• IPC : C08G-018/22(2006.01);C08F-022/10(2006.01);C08G-018/38(2006.01);C08G-018/79(2006.01);C08G-059/24(2006.01);C08G-059/68(2006.01);C08G-059/70(2006.01);

The invention relates to a semiconductor laser component (1) with a vertical emission direction, in particular a VCSEL, comprising an upper Bragg mirror (2) and a lower Bragg mirror (3). An active zone (4) for generating laser radiation (5) is arranged between the upper Bragg mirror (2) and the lower Bragg mirror (3), wherein the semiconductor laser component (1) with a vertical emission direction has an upper decoupling facet (20) for the laser radiation (5), and the upper decoupling facet (20) has both a mode-selective macrostructure (21) as well as a polarization-selective microstructure (22). The invention additionally relates to the use of a surface relief on a decoupling facet of a VCSEL, to a communication system, and to a method for producing a corresponding semiconductor laser component with a vertical emission direction.

• 출원번호 : EP2024/070748
• 출원인 : TRUMPF PHOTONIC COMPONENTS GMBH
• 특허번호 :
• IPC : H01S-005/183(2006.01);H01S-005/042(2006.01);H01S-005/062(2006.01);

Disclosed herein is a tool for an EUV exposure process, the tool comprising: a substrate support arranged to support a substrate; an electrode arranged in the path of the EUV radiation and between the substrate support and a main illumination region, wherein the main illumination region is a region through which patterned EUV radiation propagates to illuminate a substrate in the EUV exposure process; and a power supply arrangement configured to generate an electric field in a substrate supported by the substrate support.

• 출원번호 : EP2024/070740
• 출원인 : ASML NETHERLANDS B.V.
• 특허번호 :
• IPC : G03F-007/004(2006.01);G03F-007/20(2006.01);

A method for operating a radiation emitting device with the following steps is provided: - determining a temperature corrected forward voltage (VfTcor(0,y)) of an edge pixel (7) arranged in an edge region (8) of the radiation exit area (1), - determining a position and temperature corrected forward voltage (Vincrease(0,y)) of the edge pixel (7) from the temperature corrected forward voltage (VfTcor(0,y)), - determining a position and temperature corrected forward voltage (Vincrease(40,160)) of a hot spot pixel (16) being arranged in a hot spot region (17) of the radiation exit area (1) from the position and temperature corrected forward voltage of the edge pixel, - determining a temperature of the hot spot pixel (16) from the position and temperature corrected forward voltage (Vincrease(40,160)) of the hot spot pixel (16).

• 출원번호 : EP2024/070719
• 출원인 : AMS-OSRAM INTERNATIONAL GMBH
• 특허번호 :
• IPC : H05B-045/56(2020.01);G09G-001/00(2006.01);G09G-003/32(2016.01);

A laser processing apparatus includes a placement base on which a workpiece is placed, a beam shaping optical system that shapes laser light such that a first laser light irradiated region of a mask blocking part of the laser light has a rectangular shape having short edges and long edges, the beam shaping optical system capable of causing one of a first radiation width of the first irradiated region in the direction parallel to the short edges and a second radiation width of the first irradiated region in the direction parallel to the long edges to be fixed and causing the other to be changed, a projection optical system that projects a pattern on the mask onto the workpiece, and a mover that moves the first irradiated region at least in the direction parallel to the short edges to move a second laser light irradiated region of the workpiece.

• 출원번호 : 18779447
• 출원인 : Gigaphoton Inc.
• 특허번호 :
• IPC : B23K-026/073(2006.01);B23K-026/06(2006.01);B23K-026/0622(2006.01);B23K-026/066(2006.01);B23K-026/082(2006.01);

A system for measuring radiation activity of a target radioisotope being produced in a reactor core is disclosed. The system includes a cable assembly and a radiation detector. The cable assembly includes a housing, a target cable configured to position the housing, and a drive cable couplable and decouplable with the target cable. The target radioisotope is positioned within the housing. The drive cable is configured to drive the target cable. The radiation detector configured to periodically measure the radiation activity of the target radioisotope being produced.

• 출원번호 : 18780238
• 출원인 : Westinghouse Electric Company LLC
• 특허번호 :
• IPC : G21G-001/02(2006.01);G01T-001/167(2006.01);G21C-017/108(2006.01);G21C-019/22(2006.01);G21C-023/00(2006.01);

Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC)3SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.

• 출원번호 : 18779539
• 출원인 : Cardineau, Brian J.
• 특허번호 :
• IPC : C07F-007/22(2006.01);G03F-007/004(2006.01);G03F-007/20(2006.01);

A method for detecting a leak in a cladding tube in a nuclear reactor is described. The method is well-suited for use in a reactor having a plurality of cladding tubes housed in a plurality of linearly arranged channels for flowing coolant past the cladding tubes. The method includes monitoring the channels for the occurrence of an increase in radiation above a selected base line indicative of the presence of at least one fission product in the coolant in at least one of the plurality of channels, and monitoring the channels for the occurrence of time dependent changes in the strength of radiation in the coolant above the base line along the length of the at least one of the plurality of channels. The leak location is calculated by triangulating the radiation readings from a fixed linear array of detectors positioned adjacent to the channels to determine the location of the strongest radiation reading and the location along the length of the channel where the increase in radiation occurred.

• 출원번호 : 18780273
• 출원인 : Westinghouse Electric Company LLC
• 특허번호 :
• IPC : G21C-017/04(2006.01);G01T-001/24(2006.01);G21C-017/10(2006.01);H01L-031/10(2006.01);H01L-031/115(2006.01);