According to an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (C) represented by a formula (Q1) below and an acid-decomposable resin (A), in the formula (Q1), Ar1 represents an aromatic group, W1 represents an organic group, X1 represents a linking group including at least one selected from the group consisting of —O—, —S—, —C(═O)—, —S(═O)—, and —S(═O)2—, Y1 represents an electron-withdrawing group, Z1 represents a halogen atom, M+ represents a cation, each of k1 and k2 represents an integer of 1 or more, and the group represented by —X1—W1— does not include *1—O—C(═O)—*2, *1 and *2 represent bonding sites, and *1 is a bonding site to Ar1, formation of a pattern excellent in CDU in ultrafine pattern formation even after a lapse of time from the preparation is enabled.
- 출원번호 : 18813980
- 출원인 : FUJIFILM Corporation
- 특허번호 :
- IPC : G03F-007/039(2006.01);G03F-007/004(2006.01);