A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound (Q) represented by formula (1). In the formula (1), L1 represents an ester group, —CO—NR3—, a (thio)ether group, or a sulfonyl group. R4 represents a hydrogen atom, a substituted or unsubstituted C1 to C20 monovalent hydrocarbon group, a halogen atom, a hydroxy group, or a nitro group. R5 represents a C1 to C20 monovalent hydrocarbon group, a C1 to C20 monovalent halogenated hydrocarbon group, or a halogen atom, and optionally two R5s taken together represent an alicyclic structure together with the carbon atom(s) between the two R5s. L2 represents a single bond or a divalent linking group.
- 출원번호 : 18882982
- 출원인 : JSR CORPORATION
- 특허번호 :
- IPC : G03F-007/004(2006.01);C07C-069/75(2006.01);C07C-309/12(2006.01);C07C-309/17(2006.01);C07C-309/27(2006.01);C07D-207/416(2006.01);C07D-307/00(2006.01);C07D-307/94(2006.01);C07D-311/00(2006.01);C07D-313/06(2006.01);C07D-321/06(2006.01);C07D-327/04(2006.01);C07D-327/06(2006.01);G03F-007/039(2006.01);G03F-007/32(2006.01);