The present disclosure provides an intralocular-lens (IOL) or ophthalmic device including an optic and at least one haptic, at least a portion of which is formed from a photoresponsive shape memory polymer network, such as a polydomain azo liquid crystalline polymer network (PD-LCN). The present disclosure further provides systems and methods for adjusting the position of such an IOL or other ophthalmic device using polarized laser radiation.

• 출원번호 : 18965096
• 출원인 : AKINAY, ALI
• 특허번호 :
• IPC : A61F-002/16(2006.01);A61F-009/008(2006.01);A61L-027/16(2006.01);A61L-027/26(2006.01);A61L-027/50(2006.01);

A method for processing a substrate within a processing chamber comprises receiving a first radiation signal corresponding to a film on a target element disposed within the processing chamber, analyzing the first radiation signal, and controlling the processing of the substrate based on the analyzed first radiation signal. The processing chamber includes a substrate support configured to support the substrate within a processing volume and a controller coupled to a first sensing device configured to receive the first radiation signal.

• 출원번호 : 18965312
• 출원인 : ZHU, Zuoming
• 특허번호 :
• IPC : H01L-021/66(2006.01);H01L-021/67(2006.01);

The present invention relates to a heat sink structure and a manufacturing method thereof, in which a plurality of heat radiation fin parts, which is configured to radiate heat, is fixed to a heat radiation surface of a heat sink main body part by laser welding, such that thicknesses of and intervals between the plurality of heat radiation fin parts may be minimized, heat dissipation performance may be improved, a weight may be greatly reduced, and production lead time and manufacturing costs may be significantly reduced by manufacturing only the heat sink main body part by casting.

• 출원번호 : 18964447
• 출원인 : KMW INC.
• 특허번호 :
• IPC : H05K-007/20(2006.01)

개시된 주제의 구체예는 발광층을 포함하는 하나 이상의 유기층, 하나 이상의 유기층 상에 배치된 제1 전극층, 제1 전극층의 일부로서 형성된 복수의 나노구조체, 기판 및 제2 전극층을 포함하는 디바이스로서, 제2 전극층은 기판 상에 배치되고, 하나 이상의 유기층은 제2 전극층 상에 배치되고, 복수의 나노구조체를 포함하는 제1 전극층은 하나 이상의 유기층 상에 그리고 발광층의 소정의 임계 거리 이내에 배치되는 디바이스를 제공한다.

• 출원번호 : 10-2024-0175449
• 출원인 : 유니버셜 디스플레이 코포레이션
• 특허번호 :
• IPC : H10K-050/805;H10K-102/00;

Method of forming pattern in photoresist layer includes forming photoresist layer over substrate, selectively exposing photoresist layer to actinic radiation forming latent pattern. Latent pattern is developed by applying developer to form pattern. Photoresist layer includes photoresist composition including polymer: A1, A2, L are direct bond, C4-C30 aromatic, C4-C30 alkyl, C4-C30 cycloalkyl, C4-C30 hydroxylalkyl, C4-C30 alkoxy, C4-C30 alkoxyl alkyl, C4-C30 acetyl, C4-C30 acetylalkyl, C4-C30 alkyl carboxyl, C4-C30 cycloalkyl carboxyl, C4-C30 hydrocarbon ring, C4-C30 heterocyclic, —COO—, A1 and A2 are not both direct bonds, and are unsubstituted or substituted with a halogen, carbonyl, or hydroxyl; A3 is C6-C14 aromatic, wherein A3 is unsubstituted or substituted with halogen, carbonyl, or hydroxyl; R1 is acid labile group; Ra, Rb are H or C1-C3 alkyl; Rf is direct bond or C1-C5 fluorocarbon; PAG is photoacid generator; 0x/(x+y+z)1, 0y/(x+y+z)1, and 0z/(x+y+z)1.

• 출원번호 : 18964266
• 출원인 : Taiwan Semiconductor Manufacturing Company, Ltd.
• 특허번호 :
• IPC : G03F-007/004(2006.01);C08F-212/14(2006.01);C08F-220/38(2006.01);G03F-007/038(2006.01);G03F-007/039(2006.01);G03F-007/16(2006.01);G03F-007/20(2006.01);G03F-007/36(2006.01);G03F-007/38(2006.01);

Methods and compositions for nuclear delivery and transcriptional repression employ a cell-penetrant MeCP2 fusion protein.

• 출원번호 : 18964332
• 출원인 : The Regents of the University of California
• 특허번호 :
• IPC : C07K-014/47(2006.01);A61K-038/00(2006.01);

An information processing apparatus acquires a conversion parameter for converting a position in an inspection image captured by irradiating an inspection target object with radiation along an irradiation direction into a position in structure information representing a three-dimensional structure of the inspection target object, the conversion parameter including the irradiation direction in the structure information; and converts a position of a discontinuity of the inspection target object in the inspection image into a position of the discontinuity in the structure information by using the conversion parameter.

• 출원번호 : 18963487
• 출원인 : TANAKA, Eiichi
• 특허번호 :
• IPC : G06T-007/00(2017.01);G06T-005/70(2024.01);

A data storage system for use in a high radiation environment has a radiation-hardened storage controller that measures a current draw of a storage drive in a storage array. The storage drive is not radiation-hardened. Based on a characteristic of the current draw, a latch up is detected the storage drive. Based on the detected latch up, power is removed from all or part of the storage drive. After a cooling period has elapsed, the power is reapplied to the storage drive.

• 출원번호 : 18962257
• 출원인 : Trantham, Jon D.
• 특허번호 :
• IPC : G06F-003/06(2006.01)

A reflective optical element (11), in particular for reflecting EUV radiation (14) includes: a substrate having an optical surface on which a reflective coating (13) is applied. The substrate has a quasi-monocrystalline volume region (8). An associated method for producing the substrate (10) for the optical element (11) includes: introducing a starting material, preferably a metal or a semimetal, into a container and melting the starting material, producing a material body having a quasi-monocrystalline volume region (8) by directionally solidifying the molten starting material proceeding from a plurality of monocrystalline seed plates arranged in the region of a base of the container, and producing the substrate by processing the material body to form an optical surface (12).

• 출원번호 : 18962162
• 출원인 : SCHMEHL, Andreas
• 특허번호 :
• IPC : G02B-005/08(2006.01);C30B-011/14(2006.01);C30B-029/06(2006.01);C30B-029/08(2006.01);

A device for generating extreme ultraviolet (EUV) radiation includes an optical beam-forming arrangement with a focusing unit for forming a laser beam, and a target material configured to be irradiated with the laser beam to emit EUV radiation. The beam-forming arrangement includes a beam rotator for image field rotation of the laser beam.

• 출원번호 : 18961599
• 출원인 : Piehler, Stefan
• 특허번호 :
• IPC : H05G-002/00(2006.01)