A method of controlling a substrate etching process includes disposing a surface or a surface of a substrate adjacent to etching fluid to produce an etchant-substrate interface and placing an electromagnetic radiation emitter on a moveable positioner. The method includes focusing electromagnetic radiation from the electromagnetic radiation emitter to a portion of the etchant-substrate interface. The portion of the etchant-substrate interface has a surface area of not less than 0.05 squared micrometers and not greater than 80 squared millimeters. The method includes selectively heating the portion of the etchant-substrate interface and transmitting a monitoring beam through the substrate. The method includes measuring a property of the substrate via the monitoring beam.

• 출원번호 : 18949147
• 출원인 : Goeckeritz, Jeremy
• 특허번호 :
• IPC : G01N-023/06(2006.01);C03C-015/00(2006.01);C04B-041/53(2006.01);C04B-041/91(2006.01);G02B-003/00(2006.01);G02B-005/08(2006.01);H01L-021/67(2006.01);

Disclosed are methods for minimizing x-ray scattering artifacts, the method comprising: contacting an object with an x-ray scattering mitigation material. The contacting can comprise coating the x-ray scattering material on the object, including spraying a solution of suspension of an x-ray scattering mitigation material onto the object or dry powder coating the object with a x- ray scattering mitigation material. Alternatively, the contacting can comprise immersing the object in a fluid comprising the x-ray scattering material. The fluid can be a gas, a liquid, or a gel. The disclosed x-ray scattering mitigation material can be optimized for mitigating Compton radiation scattering or for mitigating Rayleigh radiation scattering. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.

• 출원번호 : 18949297
• 출원인 : Scheiffele, Gary W.
• 특허번호 :
• IPC : G21K-001/10(2006.01);B05D-001/12(2006.01);C09D-001/00(2006.01);C09D-005/03(2006.01);C09D-005/32(2006.01);

A method includes, using a laser, thinning a target site in an iris of an eye by irradiating the target site with one or more first radiation-pulses. Subsequently to thinning the target site, a peak intensity of radiation beams emitted by the laser is increased and, subsequently to increasing the peak intensity, a hole is formed through the target site by, using the laser, irradiating the target site with one or more second radiation-pulses.

• 출원번호 : 18947003
• 출원인 : Sacks, Zachary
• 특허번호 :
• IPC : A61F-009/008(2006.01);A61B-034/32(2006.01);A61B-090/00(2006.01);

A power generation system and related method for repowering a fossil-fueled power plant using a carbon-free nuclear steam supply system (NSSS) which replaces the existing fossil plant steam generator which burns fossil fuel such as coal, oil, or natural gas. The existing fossil plant energy conversion system including the turbine-generator (turbogenerator) and auxiliary components of the Rankine cycle is retained. The NSSS may include a small modular reactor (SMR) unit comprising a reactor vessel with nuclear fuel core and steam generator which receives heated primary coolant from the reactor to produce main steam to operate the Rankine cycle. The main steam output by the SMR unit is compressed in a steam compressor to increase its pressure to a level necessary to operate the turbogenerator. The compressor may be operated via a portion of the main steam. An intercooler of the compressor may be used for main steam reheating.

• 출원번호 : 18947667
• 출원인 : Holtec International
• 특허번호 :
• IPC : G21D-001/00(2006.01);F01K-003/00(2006.01);F01K-003/18(2006.01);F01K-003/26(2006.01);F01K-007/16(2006.01);F01K-013/02(2006.01);

In a method of generating extreme ultraviolet (EUV) radiation in a semiconductor manufacturing system one or more streams of a gas is directed, through one or more gas outlets mounted over a rim of a collector mirror of an EUV radiation source, to generate a flow of the gas over a surface of the collector mirror. The one or more flow rates of the one or more streams of the gas are adjusted to reduce an amount of metal debris deposited on the surface of the collector mirror.

• 출원번호 : 18947761
• 출원인 : Taiwan Semiconductor Manufacturing Company, Ltd.
• 특허번호 :
• IPC : G03F-007/00(2006.01);G06T-001/00(2006.01);G06T-007/00(2006.01);G21K-001/06(2006.01);H05G-002/00(2006.01);

Disclosed is a radiation and magnetic field generating apparatus irradiating photon beam radiation to in-body affected tissue of a subject including a radiation generating unit that irradiates the photon beam radiation to the subject and induces generation of secondary electrons in an area of the subject where the photon beam radiation is irradiated, a magnetic field generating unit, which is provided to be inserted into a body, which includes an insertion structure for forming a low-density space, and which forms a magnetic field in an area in which the secondary electrons are generated, and a synchronization control unit that controls formation of the magnetic field such that a part of the secondary electrons moves to the low-density space based on a relationship between an area where the photon beam radiation is irradiated and a location of an affected part, and controls the formation of the magnetic field.

• 출원번호 : 18948170
• 출원인 : RADEXEL INC.
• 특허번호 :
• IPC : A61M-025/10(2006.01);A61N-005/10(2006.01);

A mirror, in particular for a microlithographic projection exposure system, having an active optical surface, a reflective layer system for reflecting electromagnetic radiation of a working wavelength which is incident on the active optical surface, a mirror substrate (105, 205, 305) which is made of a mirror substrate material and in which structures (106, 206, 306) are arranged that differ from the surrounding mirror substrate material in terms of the refractive index, and a layer stack which is located between the mirror substrate (105, 205, 305) and the reflective layer system. The layer stack has an absorber layer (110, 210, 310) an AR layer (120, 220, 320) and a smoothing layer (130, 230, 330) one after the other in a stacking direction running from the mirror substrate (105, 205, 305) to the reflective layer system.

• 출원번호 : 18947058
• 출원인 : WEBER, Joern
• 특허번호 :
• IPC : G03F-007/00(2006.01)

An apparatus, including: an electromagnetic radiation source producing radiation for illuminating a sample located at an optical path depth and providing the radiation to the sample to facilitate determining the optical path depth within the sample; an interferometer including: a reference arm a first portion of the radiation is delivered to, a sample arm a second portion of the radiation is delivered, a first optical subsystem coupled to the sample arm to interrogate the sample with the radiation delivered to the sample arm and to collect backscattered radiation from the sample, and a second optical subsystem coupled to the reference arm and the first optical subsystem to generate interference fringes between the collected backscattered radiation and the radiation delivered to the reference arm; and a data collection and processing system in communication with the interferometer configured to compute the optical path depth of the sample from the received interference fringes.

• 출원번호 : 18947940
• 출원인 : Vakoc, Benjamin
• 특허번호 :
• IPC : G01N-021/45(2006.01);G01B-009/02(2006.01);G01B-009/02001(2006.01);G01B-009/02091(2006.01);

This application relates generally to prostate specific membrane antigen (PSMA) targeting compounds which may be complexed to a radioisotope. Pharmaceutical compositions including such compounds also disclosed. Such compounds or pharmaceutical compositions may be used in nuclear medicine for the in-vivo imaging of various tissues, and the treatment and/or prevention of various PSMA-expressing cancers, especially prostate cancer.

• 출원번호 : 18947606
• 출원인 : PUTTICK, Simon
• 특허번호 :
• IPC : A61K-051/04(2006.01);C07B-059/00(2006.01);

A composite material having a black pigment and a textile material. The composite material has a reflectivity toward near infrared electromagnetic radiation having a wavelength from 800 nm to 2500 nm of greater than or equal to 12%, and the composite material has a reflectivity toward visible light having a wavelength from 350 nm to 750 nm of less than or equal to 10%.

• 출원번호 : 18946523
• 출원인 : Toyota Motor Engineering & Manufacturing North America, Inc.
• 특허번호 :
• IPC : G02B-005/08(2006.01);D06M-011/42(2006.01);