According to an actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) including a repeating unit (a1) having a partial structure in which a phenolic hydroxy group is protected with a structure represented by a formula (1) below, a pattern in which generation of defects is suppressed can be formed: wherein X represents a halogen atom or an electron-withdrawing group, R1 represents a hydroxy group or an organic group, k represents an integer of 0 to 3, n represents an integer of 0 to (4+2k), m represents an integer of 1 to (5+2k), satisfying a relationship of 1≤(n+m)≤(5+2k), and a plurality of R1's and X's may be the same or different according to an integer of n and m respectively, and * represents a bonding site to an oxygen atom of the phenolic hydroxy group.
- 출원번호 : 18808397
- 출원인 : FUJIFILM Corporation
- 특허번호 :
- IPC : G03F-007/038(2006.01);G03F-007/004(2006.01);G03F-007/039(2006.01);