본문 바로가기

Report

All 506,367 Page 19/50,637

검색
  • 506187

    us

    Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC)3SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.
    • 출원번호 : 18779539
    • 출원인 : Cardineau, Brian J.
    • 특허번호 :
    • IPC : C07F-007/22(2006.01);G03F-007/004(2006.01);G03F-007/20(2006.01);
  • 506186

    us

    A laser processing apparatus includes a placement base on which a workpiece is placed, a beam shaping optical system that shapes laser light such that a first laser light irradiated region of a mask blocking part of the laser light has a rectangular shape having short edges and long edges, the beam shaping optical system capable of causing one of a first radiation width of the first irradiated region in the direction parallel to the short edges and a second radiation width of the first irradiated region in the direction parallel to the long edges to be fixed and causing the other to be changed, a projection optical system that projects a pattern on the mask onto the workpiece, and a mover that moves the first irradiated region at least in the direction parallel to the short edges to move a second laser light irradiated region of the workpiece.
    • 출원번호 : 18779447
    • 출원인 : Gigaphoton Inc.
    • 특허번호 :
    • IPC : B23K-026/073(2006.01);B23K-026/06(2006.01);B23K-026/0622(2006.01);B23K-026/066(2006.01);B23K-026/082(2006.01);
  • 506185

    us

    A system for measuring radiation activity of a target radioisotope being produced in a reactor core is disclosed. The system includes a cable assembly and a radiation detector. The cable assembly includes a housing, a target cable configured to position the housing, and a drive cable couplable and decouplable with the target cable. The target radioisotope is positioned within the housing. The drive cable is configured to drive the target cable. The radiation detector configured to periodically measure the radiation activity of the target radioisotope being produced.
    • 출원번호 : 18780238
    • 출원인 : Westinghouse Electric Company LLC
    • 특허번호 :
    • IPC : G21G-001/02(2006.01);G01T-001/167(2006.01);G21C-017/108(2006.01);G21C-019/22(2006.01);G21C-023/00(2006.01);
  • 506184

    us

    Light-emitting device (1) includes waveguide structure (5) and exterior part (4). Waveguide structure (5) includes light receiving surface (51) including incident end surface (31) and first surface (41), and radiation surface (52) including emission end surface (32) and second surface (42). A position of waveguide structure (5) with respect to light source (2) is determined to cause light (L1) to be incident on light receiving surface (51). Incident range (R) on which light (L1) is incident on light receiving surface (51) includes at least a part of incident end surface (31) and at least a part of first surface (41) such that a part of light (L1) is incident on incident end surface (31) and another part of light (L1) is incident on first surface (41), passes through exterior part (4), and is emitted from second surface (42).
    • 출원번호 : 18779051
    • 출원인 : NISHIKAWA, YUKIO
    • 특허번호 :
    • IPC : H01S-005/02253(2006.01)
  • 506183

    us

    The present disclosure relates to an integrated chip including a substrate and a pixel. The pixel includes a photodetector. The photodetector is in the substrate. The integrated chip further includes a first inner trench isolation structure and an outer trench isolation structure that extend into the substrate. The first inner trench isolation structure laterally surrounds the photodetector in a first closed loop. The outer trench isolation structure laterally surrounds the first inner trench isolation structure along a boundary of the pixel in a second closed loop and is laterally separated from the first inner trench isolation structure. Further, the integrated chip includes a scattering structure that is defined, at least in part, by the first inner trench isolation structure and that is configured to increase an angle at which radiation impinges on the outer trench isolation structure.
    • 출원번호 : 18778992
    • 출원인 : Huang, Cheng Yu
    • 특허번호 :
    • IPC : H01L-027/146(2006.01);H01L-031/107(2006.01);
  • 506182

    us

    In the context of forming radiation patternable structures especially for EUV patterning, wafer structures are described comprising a substrate having a smooth top surface and a radiation sensitive organometallic coating having an average thickness of no more than 100 nm and no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Corresponding methods for forming a low defect coating comprise spin coating a purified radiation sensitive organometallic resist solution onto a wafer using a spin coater system comprising a delivery line and a delivery nozzle connected to the delivery line to form a coated wafer, and drying the coated wafer to form a radiation sensitive organometallic coating having no more than about 1 defect per square centimeter with a defect size of greater than 48 nm, evaluated with a 3 mm edge exclusion. Methods are provided for improved filtering for particle removal from radiation patternable organometallic resist compositions.
    • 출원번호 : 18778388
    • 출원인 : Clark, Benjamin L.
    • 특허번호 :
    • IPC : G03F-007/004(2006.01);G03F-007/16(2006.01);
  • 506181

    us

    A method of additive manufacturing of a three-dimensional object, comprises: dispensing from a first array of nozzles a modeling material formulation containing a polyimide precursor to form a layer in a configured pattern corresponding to a shape of a slice of the object; applying to the layer ultraviolet radiation and infrared radiation from two different radiation sources; and repeating the dispensing and the application of radiation to form a plurality of layers in configured patterns corresponding to shapes of other slices of the object. Optionally, an additional modeling material formulation or a support material formulation is dispensed from a second array of nozzles.
    • 출원번호 : 18777593
    • 출원인 : Stratasys Ltd.
    • 특허번호 :
    • IPC : B29C-064/129(2006.01);B29C-064/209(2006.01);B29C-064/277(2006.01);B29C-064/393(2006.01);B29K-079/00(2006.01);B33Y-010/00(2006.01);B33Y-030/00(2006.01);B33Y-050/02(2006.01);C08G-073/12(2006.01);
  • 506180

    us

    A hyperspectral imaging apparatus based on a monolithic or free space optical spatial heterodyne spectrometer (SHS) design, array detector, electromagnetic radiation source, and optical collection element is described. The apparatus enables the simultaneous acquisition of spatially isolated Fizeau fringe patterns, each having an encoded light product that is decoded to produce a spectral fingerprint of the interrogated object. Features specific to the SHS, such as a large entrance aperture, large acceptance angle, and no moving parts, enable a variety of optical collection schemes including lens arrays, solid-core and hollow core waveguides, and others. In one example, a microlens array (MLA) is configured with the hyperspectral imaging apparatus to simultaneously image many hundred spatially isolated Fizeau fringe patterns while interrogating an object using an electromagnetic radiation source. Each Fizeau fringe pattern recorded by the array detector is decoded to produce a full Raman or laser-induced breakdown spectroscopy (LIBS) spectrum. Compared to prior art, the hyperspectral imaging apparatus overcomes the primary limitations of needing to trade time resolution for both spectral and spatial data density because the imaging apparatus simultaneously acquires both spectral and special information. Based on the selection and configuration of diffraction gratings, the grating aperture size, Littrow wavelength (i.e., heterodyne wavelength), and optical collection configuration, the apparatus can be tailored to produced low or high spectral resolution with a spectral bandpass that covers a portion or the entire Raman spectral range (up to 4200 cm−1) and for LIBS as well.
    • 출원번호 : 18778560
    • 출원인 : ANGEL, STANLEY MICHAEL
    • 특허번호 :
    • IPC : G01N-021/65(2006.01)
  • 506179

    ko

    본 발명은 기체유입부와 기체유출부를 가진 외함과, 상기 외함 내 마련되어 상기 기체유입부를 통해 유입된 유체의 수소와 반응하여 물로 재결합하는 촉매구조체를 포함하는 피동촉매형 수소 재결합 장치에 있어서, 상기 기체유출부는, 상기 외함의 전면 상부와 적어도 일 측면 상부에 마련되는 것을 특징으로 하는 피동촉매형 수소 재결합 장치를 제공한다.
    • 출원번호 : 10-2024-0095227
    • 출원인 : (주) 세라컴
    • 특허번호 :
    • IPC : G21C-009/06
  • 506178

    ko

    활성제를 저용량으로 포함하는 방법, 조성물, 및 키트를 포함한, 개체에서 방사선 요법 및/또는 화학요법 노출과 연관된 하나 이상의 부작용을 치료 및/또는 예방하기 위한 방법, 조성물, 및 키트가 개시된다. 일부 구체예에서, 활성제를 저용량으로 포함하는 방법, 조성물, 및 키트를 포함한, 개체에서 조직 손상을 치료 및/또는 예방하기 위한 방법, 조성물, 및 키트가 제공된다.
    • 출원번호 : 10-2024-7024244
    • 출원인 : 바이오미매틱스 제이브이, 엘엘씨;듀크 유니버시티;
    • 특허번호 :
    • IPC : A61K-031/555;A61K-031/495;A61K-033/243;A61K-045/06;A61P-001/02;A61P-017/00;A61P-017/14;A61P-025/28;A61P-035/00;A61P-043/00;